Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX

In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature 80?C is presented and analysed. We studied basic island patterns, which present union two symmetrical parallelograms sides along predetermined crystallographic directions <n10> (2<n<8) <100>. Acute angles were smaller than 45?. have derived analytical relations for determining dimensions obstacles. The developed etching technique provides reduction distance between Before experiments, we performed simulations pattern based on level set method evolution etched patterns <n10>. Combination <610> <100> used to fabricate a matrix row in microchannel. obtained good agreement experimental results simulations. Our enable simple cost-effective various complex microfluidic platforms